High-k And CVD ALD Metal Precursors Market Growth & Trends
The global high-k and CVD ALD metal precursors market size is expected to reach USD 857.8 million by 2030, according to a new study by Grand View Research Inc. The market is expected to expand at a CAGR of 6.5% from 2023 to 2030. The demand for thin film deposition with a low thermal budget, more accuracy in thickness control, and better conformance over three-dimensional (3D) structures is increasing as semiconductor device technology advances. The market is primarily driven by the rising demand for a variety of thin-film materials for various industrial applications and the emergence of atomic layer deposition of noble elements including rhodium, iridium, palladium, and platinum.
The industry is further expanding to a higher extent due to the trend of miniaturizing semiconductors as well as electronic gadgets and the growing requirement to improve performance. Another major factor propelling the industry expansion is the growing use of semiconductors and microelectronic devices in a variety of industry verticals, including automotive, aerospace, industrial, and consumer goods. In addition, improvements in deposition methods, rising consumer demand for higher deposition speeds, and increased commercialization of High-k and CVD ALD procedures are some of the main drivers of the industry.
The COVID-19 pandemic has caused a significant decline in many businesses, including the need for materials. The global economic downturn, supply-chain constraints, a lack of semiconductor chips, and export/import restrictions have all been overcome. However, given the considerable pent-up demand and anticipated recovery in industry demand brought on by the opening of economies and a rise in consumer spending power, the short-term forecast for the high-k and CVD ALD metal precursors sector appears positive. Asia Pacific accounted for a sizable portion of the global industry and is also credited with having experienced the quickest growth in the global market, which was fueled by the explosive rise of electronic devices and fueled product demand.
Request a free sample copy or view report summary: High-k And CVD ALD Metal Precursors Market Report
High-k And CVD ALD Metal Precursors Market Report Highlights
- The interconnect segment accounted for the largest share of the overall revenue in 2022 and is expected to remain dominant throughout the forecast period
- Asia Pacific was the dominant regional market in 2022 and is projected to expand further at the fastest growth rate over the forecast period
- This growth can be attributed to the high demand for high-k and ALD/CVD metal precursors and the rapid expansion of the electronics industry in China, India, and other Southeast Asian countries
- The world’s center for semiconductor production is located in important Asian economies like China, South Korea, and Taiwan, which contributes to the region’s dominance
High-k And CVD ALD Metal Precursors Market Segmentation
Grand View Research has segmented the global high-k and CVD ALD metal precursors market report based on technology and region:
High-k And CVD ALD Metal Precursors Technology Outlook (Revenue, USD Million, 2018 - 2030)
- Interconnect
- Capacitors
- Gates
High-k And CVD ALD Metal Precursors Regional Outlook (Revenue, USD Million, 2018 - 2030)
- North America
- U.S.
- Canada
- Europe
- U.K.
- Germany
- Rest of Asia Europe
- Asia Pacific
- China
- India
- Japan
- Rest of Asia Pacific
- Latin America
- Brazil
- Mexico
- Rest of Latin America
- Middle East & Africa
List of Key Players of High-k And CVD ALD Metal Precursors Market
- Air Liquide
- Air Products & Chemicals, Inc.
- Praxair
- Linde
- Dow Chemical
- Tri Chemical Laboratories Inc.
- Samsung
- Strem Chemicals, Inc.
- Colnatec
- Merck KGAA
The new High-k and ALD/CVD Metal Precursors Market report offers a comprehensive study of the current scenario of the market including major market dynamics.
Also, it highlights the in-depth marketing research with the newest trends, drivers, and segments with reference to regional and country.
Further, this report profiles top key players and analyze their market share, strategic development, and other development across the world.The research report also covers the comprehensive profiles of the key players in the market and an in-depth view of the competitive landscape worldwide.
The major players in the High-k and ALD/CVD Metal Precursors Market include Dow Chemicals, Air Liquide, Merck Group, Air Products and Chemicals Inc., Praxair Technology Inc., Samsung Electronics Co. Ltd., Nanmat Technology Co. Ltd., TSI Incorporated Tri Chemical Laboratories Inc, and JSR Corp..
This section includes a holistic view of the competitive landscape that includes various strategic developments such as key mergers & acquisitions, future capacities, partnerships, financial overviews, collaborations, new product developments, new product launches, and other developments.Get more information on "Global High-k and ALD/CVD Metal Precursors Market Research Report" by requesting FREE Sample Copy at https://www.valuemarketresearch.com/contact/high-k-and-ald-cvd-metal-precursors-market/download-sampleMarket SegmentationThe broad High-k and ALD/CVD Metal Precursors Market has been sub-grouped into the Technology, and Region.
The report studies these subsets with respect to the geographical segmentation.
The Global High-k And ALD/CVD Metal Precursors Market Research Report - Industry Analysis, Size, Share, Growth, Trends and Forecast Till 2026 gives an evaluation of the market developments based on historical studies and comprehensive research respectively.
The market segments are also provided with an in-depth outlook of the competitive landscape and a listing of the profiled key players.High-k refers to dielectric materials which uses ALD and CVD metal precursors technique and technology to fabricate materials used to produce semiconductor devices.
ALD atomic layer deposition is a technique used to produce thin films of standard quality.
CVD chemical vapor deposition is a process used to make excellent quality and high performance devices.
ALD and CVD use gas and chemical deposition techniques respectively to produce excellent dielectric and semiconductor devices.Asia Pacific is geography wise the most dominant region for the global high-k and ALD/CVD metal precursors market.
Major regions like India China and Taiwan augment market growth of Asia Pacific region.
